| Customization: | Available |
|---|---|
| Coating Color: | Silver Grey |
| Application: | Semiconductor Epitaxy |
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Hunan Dezhi New Material Co., Ltd. is a high-tech enterprise focusing on the research, development, production and sales of high-end materials such as carbon-based and ceramics. Dezhi is the first company to achieve mass production of Solid SiC etching components for semiconductors in China, and has high-end technology, equipment and a high-level R&D team. The company currently has about 300+ employees, of which R&D personnel account for 20%. Our R&D capabilities and product quality are unanimously recognized by the industry and main products include CVD@SiC coatings, Solid SiC, Sin@SiC-SiC, CVD@TaC coatings and other series of products, which are widely used in LED optoelectronics, integrated circuits, third-generation semiconductors and other fields.
Dezhi advanced material products cover carbon-based, ceramic and other high-end materials, used in all aspects of semiconductor chip manufacturing, such as single crystal growth, epitaxy, etching, diffusion, CVD, PVD, etc.
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High Temperature Resistance |
High Pressure Resistance |
Wear Resistance |
High Service Life |
Corrosion Resistance |
High Purity |
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•Substrate: Sintered SiC (thickness>0.5mm) |
•Coating: β-SiC (thickness<300μm) |
Wafer Fabrication
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• Epitaxial |
• Diffusion |
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• Precision Machining (Graphite) |
• Low Pressure Chemical Vapor Deposition |
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• High density |
• Strong combination |
• High purity |
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• High thermal conductivity |
• Corrosion resistance |
• Resistance to cracking |
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• LED Photoelectric |
• Integrated circuits |
• Third-generation semiconductors |
| Product Range | Materials and properties | Application Scenario | Implementation Technology | Performance requirements |
| CVD@SiC coating series | Substrate: Isostatic graphite (Thickness 1~20 mm) Coating: β-SiC (Thickness <100 μm) | Wafer manufacturing Epitaxial growth Diffusion | Precision machining (graphite) Low pressure chemical vapor deposition (LPCVD) | High density Strong bonding High purity High thermal conductivity Corrosion resistance Anti-cracking |
Advantages of SiC Coated Graphite Wafer Carrier
1. Enhanced Durability: The SiC coating increases the wear resistance of the graphite material, reducing the risk of degradation over multiple uses.
2. High-Temperature Stability: The Wafer Carrier can tolerate the extreme temperatures common in epitaxial growth furnaces, maintaining its structural integrity without warping or cracking.
3. Improved Yield and Process Efficiency: By ensuring the wafers are handled securely and consistently, the SiC-coated graphite Wafer Carrier helps improve the overall yield and efficiency of the epitaxial growth process.
4. Customization Options: The carrier can be customized in terms of size and configuration to meet the specific needs of different epitaxial reactors, providing flexibility for a wide range of semiconductor applications.
Advantages of Hunan Dezhi New Materail
1. Fast delivery response: Sample delivery 7-15 days & bulk delivery 1 month
2. Flexible customization service: Dedicated production lines to match customer needs & Personalized service For product solution support
3. Professional technical support: Professional material testing and analysis center & Quickly cooperate with development and verification needs
4. Robust supply chain: Stable supply chain system, Many long-term cooperative suppliers with good reputation.
Q. Are you a factory or a trading company?
A: we are the leading factory of SiC Material Components For Semiconductors in China.
Q. When can i get the price?
A: We usually quote within 24 hours after getting your detailed requirements,like size, quantity etc. .
If it is an urgent order, you can call us directly.
Q. What about the lead time for mass product?
A: The lead time is based on the details of the product, generally 20-30 working days.
Q.What is your terms of delivery?
A: We accept FOB, CFR, CIF, EXW, etc. You can choose the most convenient way for you.
Besides that, we can also shipping by Air and Express.
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